1. Method for utiizing fabrication defect of an article
  Method for utiizing fabrication defect of an article: Overlap defect onto design layout pattern for failure defect check. This invention is a foundation for any defect tool which applies defect data and design layout data for analysis.
Patent no.: US 8,473,223, ROC I409661, and CN 1235522



2. Method for smart defect screen and sample
  Method for smart defect screen and sample: Perform Critical Area Analysis (CAA) on the overlapped defect and design layout pattern to classify killer defect and nuisance defect accurately.
Patent no.: US 8,312,401, ROC I402928, and CN 1614876



3. Method and system for intelligent defect classification and sampling, and non-transitory computer readable storage device
  Method and system for intelligent defect classification and sampling, and non-transitory computer readable storage device: Since CAA value is proportional to the probability of a defect’s failure. The CAA value based defect sample selection method can increases the discovery of bad defects successfully.
Patent no.: US 10,228,421, ROC I564741



4. Integrated interfacing system and method for intelligent defect yield solutions
  All the defect classification, sampling, and other functions must be initiated by a server and an interface system. This is key to automatic operation and efficiency improvement.
Patent no.: US 9,129,237, ROC I467400, and CN 2017094