How to prevent serious defect incident in 5nm, 7nm, 10nm fabs?
  From news report, Samsung and TSMC are expected to enter 5nm process mass production in 2020. The competition on 5nm wafer yield and market share will be very intense. ESI’s brand new OpenShortPlatform, including two crucial technologies “Smart defect screen and sample technology” and “Defect size metrology technology”, can discover various types of tiny yield loss defects in 5nm process and enhance 5nm wafer yield.

如何防止 5 、7、10 奈米廠嚴重缺陷異常事件?
  一個嶄新的晶圓缺陷分析平台,它結合了智慧型缺陷篩選取樣暨缺陷尺寸計量等兩大關鍵技術,能夠在先進 5 、 7 、 10 奈米半導體廠中高效率地檢出各類超細微的良率損失缺陷,以利製程異常事件及早獲得修正,進而確保晶圓良率。