ESI OpenShort™ Coordinate Conversion Product
Toward the defect analysis of 45/40 technology node process, it has
become very difficult to discover failure defect with the traditional defect
analysis method. By then, design layout was utilized in the defect
analysis.
Elite Semiconductor Inc. was the first company to achieve the
solution of converting inline defect coordinate into design layout
coordinate accurately.
A first Coordinate Conversion was first developed in early 2010.
Soon, a revised Mask Frame-based Coordinate Conversion proved its
accuracy in May, 2010 under all kind of wafer inspection conditions. The
ESI OpenShort™ Coordinate Conversion Product paves the
foundation to execute Killer Defect Index accurately.
The ESI OpenShort™ Coordinate Conversion Product can be
licensed and used in the application of Pattern Grouping in a systematic
defect test, Killer Defect Index in a nuisance defect and killer defect
classification, inline defect to design layout pattern for failure analysis,
etc.
